Curriculum Vitaes
Profile Information
- Affiliation
- Professor, Faculty of Science and Technology, Department of Engineering and Applied Sciences, Sophia University(Concurrent)Chairperson of the Master's(Doctoral) Program in Science and Technology
- Degree
- 工学博士(東京工業大学)
- Researcher number
- 90222041
- J-GLOBAL ID
- 200901062540285806
- researchmap Member ID
- 1000073283
- External link
(Subject of research)
Optical Switch
Metal Organic Vapor Phase Epitaxy
Wavelength Divide Optical Switch
All Optical Switch
Quantum Dot
Optical Interconnerction
Electron Device
Research Interests
13Research Areas
2Research History
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Apr, 1991 - Mar, 1992
Papers
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physica status solidi (a), 222(18) 2500430, Aug 13, 2025 Peer-reviewedLast authorThe lasing characteristics of GaInAsP separate confinement heterostructure (SCH)–multiple quantum well (MQW) laser diodes grown on hydrophilic‐bonded InP–Si substrates are investigated. A hydrophilic bonding method is used to directly bond an InP thin film to a Si substrate, varying the thickness of the InP film and the maximum annealing temperature to optimize the bonding process and minimize void formation. The results show that controlling the annealing temperature and InP film thickness strongly affects the void characteristics, including the void area occupancy, void density, and void angle; it is also found that a lower void area occupancy and a lower void density correlate with reduced threshold current densities in the laser diodes. The laser diodes grown on InP/Si substrates demonstrate threshold current densities that are comparable to or even lower than those grown on InP substrates, provided that the void characteristics are sufficiently controlled. These findings underscore the importance of optimizing substrate fabrication processes to enhance the performance of laser diodes on InP/Si substrates. To improve the efficiency and performance of laser diodes for various applications, future work should focus on further refining these methods and exploring additional factors that influence void formation and laser properties.
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Physica Status Solidi A, 2400865-1-2400865-6, Mar 26, 2025 Peer-reviewedLast authorThis study investigates the effects of different annealing sequences on the hydrophilic bonding of InP/Si substrates for GaInAsP laser diodes (LDs). Several annealing profiles are explored, including a process with slow temperature ramping over a specific range to minimize void formation, and compared to the traditional 8‐hour annealing process, which uses a constant annealing rate. The slow ramping approach within a targeted temperature range is found to be more effective in reducing void formation and improving bonding quality. GaInAsP lasers grown on substrates annealed using this method demonstrate improved performance, showing the potential for optimized annealing processes to enhance the quality and efficiency of bonded LDs.
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Physica Status Solidi A, 2400652-1-2400652-6, Nov, 2024 Peer-reviewedLast author
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Journal of Electronic Materials, Jul 16, 2024 Peer-reviewedLast author
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Physica Status Solidi A, 2300677-1-2300677-6, Feb, 2024 Peer-reviewedLast author
Misc.
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Proceedings of the IEICE General Conference, 2016(2) 70-70, Mar 1, 2016
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ITE Technical Report, 39(12) 15-20, Mar, 2015Emission wavelength control of InAs QDs using MOVPE have been studied. Emission wavelength in each arrayed waveguides was controlled by selective area growth of MOVPE using SiO2 mask. Heights of QDs were controlled by using double-capping method, and emission wavelength was controlled by changing the composition of GaInAs buffer layer beneath the QDs. By using these methods, broadband InAs QDs LED, more than 600nm bandwidth, and flat-top spectrum have been obtained.
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Proceedings of the IEICE General Conference, 2015(2) 61-61, Feb 24, 2015
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Technical report of IEICE. OPE, 114(97) 15-18, Jun 20, 2014We have demonstrated (Ga)InAs/InP QD arrayed waveguide LED on directly bonded InP/Si substrate. Electroluminescence signal from the LED has been achieved and comparable peak wavelength was observed from both the sample and reference grown on InP substrate. These results are promising in terms of integration of communication wavelength light source on InP/Si substrate.
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IEICE technical report. Electron devices, 113(449) 51-54, Feb 27, 2014A nanowire-CMOS heterogeneously integrated circuit is demonstrated. The circuit consists of a voltage divider and a delta-sigma modulator (DSM); InAs nanowires are used in the voltage divider. InAs nanowires are deposited on a CMOS substrate by using Field-Assisted Self-Assembly (FASA) process based on dielectrophoresis. The DSM successfully converts the voltage across the nanowire into density-modulated digital pulses. The present result suggests that variations in the nanowire resistance caused, for example, by chemical absorption on the nanowire surface can be sensed and converted into the digital output. Furthermore, nanowire deposition is electrically monitored by measuring time variation of the current during the FASA.
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Technical report of IEICE. LQE, 113(100) 13-18, Jun 21, 2013Integrating III-V materials which enables high-speed computer with large-capacity on Si has been required. Therefore, we have fabricated InP/Si substrate employing wafer direct bonding and wet-etching. Then growth of GaInAs/InP MQW structure has been realized on the substrate using MOVPE. The same work has also been demonstrated on SiO_2-Si and Glass substrate. Furthermore, selective MOVPE growth of GaInAs/InP MQW structure has been done on the InP/Si substrate. Our work is of importance in terms of integration of several functional optical devices on heterogeneous substrate.
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IEICE technical report. Electron devices, 112(445) 43-46, Feb 27, 2013Field-assisted self-assembly process (FASA) of InAs and InAs/InP core-shell nanowires onto a Si substrate has been investigated. The dependence of the FASA yield on the frequency of the AC voltage applied between the FASA electrodes is examined. Furthermore, nanowires are deposited onto a MOS substrate to obtain an nMOS inverter. It is confirmed that the inverter operates properly.
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Proceedings of the Society Conference of IEICE, 2012(2) 58-58, Aug 28, 2012
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Proceedings of the Society Conference of IEICE, 2012(1) 236-236, Aug 28, 2012
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Proceedings of the Society Conference of IEICE, 2012(1) 122-122, Aug 28, 2012
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Technical report of IEICE. OPE, 104(507) 1-5, Dec 14, 2004A GaInAs/InP MQW-based wavelength demultiplexer composed of a waveguide array in which refractive index varies across the array yielded successful results. Since optical path length differences between waveguides in the array are achieved through refractive-index differences controlled by SiO2 mask design in selective metal-organic vapor phase epitaxy MOVPE, straight waveguide grating is possible with reducing optical propagation losses. A straight waveguide array device with a 1.4 % refractive-index difference was fabricated. The fabrication of a preliminary wavelength demultiplexer was also achieved, obtaining a wavelength separation with around 25-nm spacing and FSR of approximately 100 nm. Moreover, an optical deflector was investigated and achieved primitive deflection at 1460- and 1490-nm incident wavelengths.
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Technical report of IEICE. OPE, 98(43) 37-42, May 14, 1998We have measured the gate length dependence of the optical response characteristics in optically controlled MOSFET. By changing the pattern of optical absorption region, the leakage current was reduced remarkably, and we obtained almost same current-voltage characteristics in metal gate MOSFET. We have measured the optical response characteristics, such as modulation current, on-off ratio and responsivity in optically controlled MOSFET, and we obtained the high current modulation and responsivity by reducing the gate length of MOSFET region.
Books and Other Publications
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株式会社 情報機構, Jun 27, 2017 (ISBN: 9784865021349)
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エヌ・ティー・エス, Mar 25, 2011 (ISBN: 9784860433765)
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Institute of Pure and Applied Physics, Feb, 2005 (ISBN: 4900526193)
Presentations
321-
International Conference on Recent Trends in Materials Science & Devices 2025 (ICRTMD-2025), Sep 9, 2025
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International Conference on Recent Trends in Materials Science & Devices 2025 (ICRTMD-2025), Mar 25, 2025
Research Projects
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科学研究費助成事業 基盤研究(C), 日本学術振興会, Apr, 2021 - Mar, 2024
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重点領域研究, 上智大学, Apr, 2018 - Mar, 2022
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Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B), Japan Society for the Promotion of Science, Apr, 2018 - Mar, 2021
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Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (C), Japan Society for the Promotion of Science, Apr, 2015 - Mar, 2018
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カシオ科学振興財団, Apr, 2016 - Mar, 2018
Industrial Property Rights
6Social Activities
16Other
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Apr, 1992電磁気学Ⅲ、光電磁波伝送工学の講義においては、講義内容に関連する小テストをほぼ毎回実施している。ノートの参照を許し、また答案を回収後すぐに解答を示している。これにより学生の講義に対する理解を補助していると考えている。
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Apr, 1992研究室の輪講会において、学生たちにレポート・論文の書き方を指導することに力を入れている。レポートを書くための文献・資料をどうやって集めるか、集めた文献・資料をどのように読みこなしていくか、自分が書こうとするレポート・論文で展開する議論をどのような構成にしていくか、文献・資料をどのように利用するか、レポート・論文の書式はどのようでなければならないか、といった点を中心に指導している。
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Apr, 1992毎週行われている研究室の研究発表会において、学生たちにプレゼンテーションの仕方を指導することに力を入れている。わかりやすいプレゼンテーションをするためのパワーポイントの作り方、よりわかりやすい発表の仕方等について指導を行っている。
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Apr, 1992研究室の卒業研究生、および大学院生には、研究データ・資料のデジタル化を行うことを義務付けている。また過去の卒業論文、修士論文、博士論文、また投稿論文、国際会議、国内学会発表論文、資料等、すべていつでも参照できる環境を整えている。さらに研究に関連することは同報メールで随時情報を送っている。
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Apr, 1992本学に赴任以来、Research Reviewを3号発行した。これは、研究室所属者の雑誌投稿論文、国際会議、研究会、国内学会等の予稿をまとめたものであり、卒研生、大学院生の知的向上と成果公表をめざしたものである。