研究者業績

内田 寛

ウチダ ヒロシ  (Uchida Hiroshi)

基本情報

所属
上智大学 理工学部物質生命理工学科 教授
学位
修士(工学)(1997年3月 上智大学)
博士(工学)(2001年1月 東京工業大学)

連絡先
uchidahsophia.ac.jp
研究者番号
60327880
J-GLOBAL ID
200901055907958881
researchmap会員ID
1000367338

上智大学 理工学部物質生命理工学科 無機工業化学グループ

(上智大学大学院 理工学研究科理工学専攻 応用化学領域)

 

主要な研究テーマ:

  • 溶液プロセスを主体とした無機マイクロ・ナノ材料製造技術の研究開発(低温合成・組成制御・三次元加工・化学溶液堆積・水熱合成・超臨界流体)
  • エレクトロニクス&エネルギーデバイス用新規化合物の探索(誘電体・圧電体・半導体/高性能材料・環境調和型材料)

 

近年の活動内容:

  • 溶液プロセスによる高性能な強誘電体/圧電体薄膜の製造技術開発
  • 環境親和型強誘電体/圧電体薄膜材料の探索
  • 水熱合成プロセスによる無機材料薄膜の創製
  • 超臨界流体を用いた無機材料合成プロセスの開発


論文

 209
  • Pape Jean Gueye, Hiroshi UCHIDA, John Edouard Blendell, Keisuke Yazawa, BENJAMIN DUCHARNE
    Japanese Journal of Applied Physics 2024年11月21日  
    Abstract This study examines the effect of tensile stress on the ferroelectric properties of Pb(Zr0.4Ti0.6)O3 thin film, with a focus on Barkhausen noise, observed for the first time under such conditions. Tensile stress significantly alters domain wall motions, affecting Barkhausen noise more than average polarization. Frequency analysis identifies grain boundaries as primary pinning sites, consistent across stress levels. A non-linear relationship between stress, domain wall mobility, and polarization is found, where increased stress initially enhances pinning and polarization changes, but this effect diminishes at higher stress levels, indicating a shift in behavior.
  • Yoshiki Maekawa, Takanori Mimura, Yoshiyuki INAGUMA, Hiroshi UCHIDA, Yuxian Hu, Kazuki Okamoto, Hiroshi Funakubo
    Japanese Journal of Applied Physics 2024年8月15日  査読有り
    Abstract To investigate the Ta<sup>5+</sup>-substitution effects on crystal structure and ferroelectric property in HfO<sub>2</sub>-based films, Ta x Hf1-x O2+δ films with various film thicknesses and Ta content were prepared. The ferroelectric orthorhombic phase was formed in a wide film thickness range of 20-100 nm while in a narrow composition range of x = 0.10-0.14. These thickness-insensitive and composition-sensitive characteristics of Ta5+-substituted HfO2 film are similar to Y3+ rather than Zr4+. The X-ray photoelectron spectroscopy measurement suggests that the ionic state of Ta is not reduced and Ta x Hf1-x O2+δ film has an excess oxygen state. The excess oxygen may consist of a combination of oxygen vacancies and more interstitial oxygens. These defects facilitate the formation of the ferroelectric phase, while decreasing the breakdown voltage and increasing the leakage current in Ta5+-substituted HfO2 films. On the other hand, the generation of excess oxygen indicates the possibility of controlling oxygen vacancies which deteriorate fatigue and retention properties.
  • Lokadi Pierre Luhata, Yoshiko Iizuka, Ryotaro Eda, Hiroshi Uchida, Christian Nanga Chick, Makoto Kubo, Toyonobu Usuki
    Chemistry Letters 53(2) 2023年12月1日  査読有り
    Abstract Verbascoside (VB), a phenylpropanoid glycoside found in many medicinal plants, is attracting the attention of researchers due to its significant clinical value. This study, for the first time, attempted the green synthesis of silver nanoparticles (AgNPs) using VB as a reducing and capping agent. The synthesized VB–AgNPs were characterized using ultraviolet–visible, dynamic light-scattering, Fourier-transform infrared spectroscopy, scanning electron microscopy, and energy-dispersive X-ray analyses. The cytotoxic potency against LX-2 human hepatic stellate cells was also investigated.
  • José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder
    APL Materials 11(8) 2023年8月1日  査読有り
    Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development over the last decade, pushing them to the forefront of ultralow-power electronic systems. Maximizing the potential application in memory devices or supercapacitors of these materials requires a combined effort by the scientific community to address technical limitations, which still hinder their application. Besides their favorable intrinsic material properties, HfO2–ZrO2 materials face challenges regarding their endurance, retention, wake-up effect, and high switching voltages. In this Roadmap, we intend to combine the expertise of chemistry, physics, material, and device engineers from leading experts in the ferroelectrics research community to set the direction of travel for these binary ferroelectric oxides. Here, we present a comprehensive overview of the current state of the art and offer readers an informed perspective of where this field is heading, what challenges need to be addressed, and possible applications and prospects for further development.
  • Yusuke Yamasaki, Yukie Yokota, Hiromi Shima, Hiroshi Funakubo, Hiroshi Uchida
    Journal of the Ceramic Society of Japan 131(7) 229-235 2023年7月1日  査読有り責任著者

MISC

 54

書籍等出版物

 5
  • 大倉利典, 小嶋, 芳行, 相澤, 守, 内田, 寛, 柴田, 裕史 (担当:共著)
    培風館 2023年6月7日 (ISBN: 4563046418)
  • (担当:分担執筆, 範囲:p.94-99, 「水熱合成技術を利用した非鉛系ペロブスカイト型酸化物エピタキシャル構造体の高速製造プロセス」)
    2020年12月10日
  • 内田 寛 (担当:分担執筆, 範囲:p.389-399, 第10章第4節「ペロブスカイト型強誘電体・圧電体薄膜の結晶配向性制御による分極特性の改善」)
    情報通信協会 2020年8月31日
  • 内田 寛 (担当:分担執筆, 範囲:p.389-399 「化学的薄膜堆積 . 超臨界流体を用いたエッチング加工」)
    コロナ社 2012年9月6日 (ISBN: 9784339008371)
  • (担当:分担執筆, 範囲:p.116-119, 「エピタキシャル薄膜における応力解析技術」)
    2001年9月20日

講演・口頭発表等

 98

共同研究・競争的資金等の研究課題

 20

産業財産権

 8