理工学部 物質生命理工学科

Uchida Hiroshi

  (内田 寛)

Profile Information

Affiliation
Professor, Faculty of Science and Technology, Department of Materials and Life Sciences, Sophia University
Degree
修士(工学)(Mar, 1997, 上智大学)
博士(工学)(Jan, 2001, 東京工業大学)

Contact information
uchidahsophia.ac.jp
Researcher number
60327880
J-GLOBAL ID
200901055907958881
researchmap Member ID
1000367338

Apr. 2000 - present
Department of Chemistry, Sophia University (Research Associate)
(i) "Material-research for novel ferroelectric thin films applicable to nonvolatile random access memories" (Apr. 2000 -)
(ii) "Development of novel film-deposition techniques using supercritical fluids" (Apr. 2003 -)
[Supervisor: Prof. Isao Okada (Apr. 2000 - Mar. 2003), Prof. Seiichiro Koda (Apr. 2003 -)]

Apr. 1997 - Mar. 1999
Department of Inorganic materials, Tokyo Institute of Technology (Doctorial research)
(i) "Study on Residual Stress Analysis and Effect of the Stress on Dielectric Properties of Ferroelectric Lead Titanate Thin Film"
[Supervisor: Prof. Nobuyasu Mizutani]

Apr. 1995 - Mar. 1997
Department of Applied Chemistry, Sophia University (Master research)
(i) "Study on nitride ceramics of ternary Mg-Si-N system with high thermal conductivity"
[Supervisor: Prof. Akira Kishioka]

(Subject of research)
Fabrication and Evaluation of Ferroelectric Thin Films by Chemical Solution Deposition
Development of lead-free ferroelectirc thin films
Chemical process for synthesis of inorganic materials using supercritical fluids
Hydrothermal synthesis of metal-oxide thin films


Papers

 208
  • Yoshiki Maekawa, Takanori Mimura, Yoshiyuki INAGUMA, Hiroshi UCHIDA, Yuxian Hu, Kazuki Okamoto, Hiroshi Funakubo
    Japanese Journal of Applied Physics, Aug 15, 2024  Peer-reviewed
    Abstract To investigate the Ta<sup>5+</sup>-substitution effects on crystal structure and ferroelectric property in HfO<sub>2</sub>-based films, Ta x Hf1-x O2+δ films with various film thicknesses and Ta content were prepared. The ferroelectric orthorhombic phase was formed in a wide film thickness range of 20-100 nm while in a narrow composition range of x = 0.10-0.14. These thickness-insensitive and composition-sensitive characteristics of Ta5+-substituted HfO2 film are similar to Y3+ rather than Zr4+. The X-ray photoelectron spectroscopy measurement suggests that the ionic state of Ta is not reduced and Ta x Hf1-x O2+δ film has an excess oxygen state. The excess oxygen may consist of a combination of oxygen vacancies and more interstitial oxygens. These defects facilitate the formation of the ferroelectric phase, while decreasing the breakdown voltage and increasing the leakage current in Ta5+-substituted HfO2 films. On the other hand, the generation of excess oxygen indicates the possibility of controlling oxygen vacancies which deteriorate fatigue and retention properties.
  • Lokadi Pierre Luhata, Yoshiko Iizuka, Ryotaro Eda, Hiroshi Uchida, Christian Nanga Chick, Makoto Kubo, Toyonobu Usuki
    Chemistry Letters, 53(2), Dec 1, 2023  Peer-reviewed
    Abstract Verbascoside (VB), a phenylpropanoid glycoside found in many medicinal plants, is attracting the attention of researchers due to its significant clinical value. This study, for the first time, attempted the green synthesis of silver nanoparticles (AgNPs) using VB as a reducing and capping agent. The synthesized VB–AgNPs were characterized using ultraviolet–visible, dynamic light-scattering, Fourier-transform infrared spectroscopy, scanning electron microscopy, and energy-dispersive X-ray analyses. The cytotoxic potency against LX-2 human hepatic stellate cells was also investigated.
  • José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder
    APL Materials, 11(8), Aug 1, 2023  Peer-reviewed
    Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development over the last decade, pushing them to the forefront of ultralow-power electronic systems. Maximizing the potential application in memory devices or supercapacitors of these materials requires a combined effort by the scientific community to address technical limitations, which still hinder their application. Besides their favorable intrinsic material properties, HfO2–ZrO2 materials face challenges regarding their endurance, retention, wake-up effect, and high switching voltages. In this Roadmap, we intend to combine the expertise of chemistry, physics, material, and device engineers from leading experts in the ferroelectrics research community to set the direction of travel for these binary ferroelectric oxides. Here, we present a comprehensive overview of the current state of the art and offer readers an informed perspective of where this field is heading, what challenges need to be addressed, and possible applications and prospects for further development.
  • Yusuke Yamasaki, Yukie Yokota, Hiromi Shima, Hiroshi Funakubo, Hiroshi Uchida
    Journal of the Ceramic Society of Japan, 131(7) 229-235, Jul 1, 2023  Peer-reviewedCorresponding author
  • Yusuke Yamasaki, Yukie Yokota, Hiromi Shima, Hiroshi Uchida
    Japanese Journal of Applied Physics, 61(SN) SN1006-SN1006, Nov 1, 2022  Peer-reviewedCorresponding author
    Abstract Aiming at applications of ferroelectric and optical devices, we investigated the fabrication of one-axis-oriented lead zirconate titanate Pb(Zr,Ti)O3 (PZT) thin films on glass substrates with a processing temperature below the glass-transition point of the substrate. Chemical solution deposition (CSD)-derived PZT thin films with a preferential crystal orientation of (00l)/(h00)PZT were grown on an ITO/glass substrate with a crystalline buffer layer of calcium niobate Ca2Nb3O10 (ns-CN). This ns-CN buffer layer lowered the crystallization temperature of the CSD-derived thin films, resulting in crystalline PZT thin films with one-axis (00l) orientation and ferroelectricity of Pr = 4 μC cm−2 deposited on transparent glass substrates at a crystallization temperature of 500 °C.

Misc.

 54

Books and Other Publications

 5

Presentations

 97

Research Projects

 20

Industrial Property Rights

 8